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Volumn 7636, Issue , 2010, Pages
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Particle removal challenges of EUV patterned masks for the sub-22nm HP node
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Author keywords
defect printability; EUVL; Mask Defects; Ru oxidation; SEM damage; sub 20 nm defects cleaning
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Indexed keywords
DEFECT PRINTABILITY;
EUVL;
MASK DEFECTS;
RU OXIDATION;
SEM;
SEM DAMAGE;
AMMONIUM COMPOUNDS;
DEFECT DENSITY;
HYDROGEN PEROXIDE;
MASKS;
MIXTURES;
OXIDATION;
REMOVAL;
SCANNING ELECTRON MICROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
SILICON COMPOUNDS;
SULFURIC ACID;
SURFACE CLEANING;
SURFACE ROUGHNESS;
DEFECTS;
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EID: 77953470399
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.847056 Document Type: Conference Paper |
Times cited : (21)
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References (8)
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