Proximity effects of alternating phase shift masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue pt 1, 1999, Pages 344-349

  Maurer, Wilhelm ^a   Friedrich, Christoph ^a   Mader, Leonhard ^a   Thiele, Joerg ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COMPUTER SIMULATION; GEOMETRY; INTEGRATED CIRCUIT LAYOUT; PHOTOLITHOGRAPHY; THREE DIMENSIONAL; ULTRAVIOLET RADIATION;

ALTERNATING PHASE SHIFT MASKS; HALF TONE PHASE SHIFT MASKS; LITHOGRAPHY SIMULATION; OPTICAL PROXIMITY CORRECTION; OPTICAL PROXIMITY EFFECTS;

MASKS;

EID: 0033319605     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373330     Document Type: Conference Paper

References (8)