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Journal of Nuclear Materials

Volumn 415, Issue 1 SUPPL, 2011, Pages

Erosion of a-C:D thin films by low energy D+, D2 +, and D3 + ion beam irradiation

(6) Meyer, F W a Harris, P R a Zhang, H a Jacob, W b Schwarz Selinger, T b Von Toussaint, U b

a OAK RIDGE NATIONAL LABORATORY (United States)

b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEUTERIUM; ELLIPSOMETRY; ION BEAMS; ION BOMBARDMENT; IONS; MASS SPECTROMETRY; SPUTTERING;

ION BEAM IRRADIATION; LOW-ENERGY IMPACT; MASS SPECTROSCOPY; MASS-LOSS MEASUREMENT; MEASUREMENTS OF; MOLECULAR SIZE EFFECT; PRODUCTION YIELD; SPUTTERING YIELDS;

THIN FILMS;

EID: 79957670930 PISSN: 00223115 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnucmat.2010.08.037 Document Type: Conference Paper

Times cited : (3)

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