Optical properties of ultrathin copper thin films sandwiched between Nb-doped TiO2 films studied with spectroscopic ellipsometry

Japanese Journal of Applied Physics

Volumn 50, Issue 5 PART 1, 2011, Pages

  Lee, Hosuk ^a   Lee, Hosun ^a   Park, Jun Hyuk ^a   Kim, Han Ki ^a   Kong, Bo Hyun ^b   Cho, Hyung Koun ^b  

^a Kyung Hee University   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE CALCULATION; COPPER THIN FILM; CU FILMS; CU LAYERS; CU NANOPARTICLES; CU THIN FILM; DC MAGNETRON SPUTTERING; DIELECTRIC FUNCTION SPECTRA; DIELECTRIC FUNCTIONS; DRUDE MODELS; ELECTRON RELAXATION TIME; ELLIPSOMETRIC ANGLES; FILMS THINNER; GLASS SUBSTRATES; INTER-BAND TRANSITION; MULTILAYER MODELS; PEAK ENERGY; PERCOLATION THRESHOLDS; PLASMON FREQUENCY; SECOND DERIVATIVES; STANDARD CRITICAL POINT; TIO; ULTRA-THIN;

DC POWER TRANSMISSION; DEPOSITION; ELECTRIC RESISTANCE; METALLIC FILMS; NANOPARTICLES; NIOBIUM; OPTICAL PROPERTIES; PERCOLATION (COMPUTER STORAGE); PERCOLATION (FLUIDS); PERCOLATION (SOLID STATE); SEMICONDUCTOR QUANTUM WELLS; SOLVENTS; SPECTROSCOPIC ANALYSIS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; VAPOR DEPOSITION;

COPPER;

EID: 79957611299     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.055805     Document Type: Article

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