Composition depth profiles of Bi 3.15 Nd 0.85 Ti 3 O 12 thin films studied by X-ray photoelectron spectroscopy

Applied Surface Science

Volumn 257, Issue 17, 2011, Pages 7461-7465

  Zhang, Z H ^a   Zhong, X L ^a   Liao, H ^a   Wang, F ^a   Wang, J B ^a   Zhou, Y C ^a  

^a XIANGTAN UNIVERSITY   (China)

Author keywords

Chemical solution deposition; Composition depth profiles; Ferroelectric thin film; X ray photoelectron spectroscopy

Indexed keywords

BISMUTH COMPOUNDS; CHEMICALS; DEPOSITION; FERROELECTRIC THIN FILMS; FERROELECTRICITY; INTERFACES (MATERIALS); NEODYMIUM COMPOUNDS; OXYGEN; PHOTOELECTRONS; PHOTONS; THIN FILMS; TITANIUM; TITANIUM COMPOUNDS;

ADSORBED OXYGEN; CHEMICAL SOLUTION DEPOSITION; COMPONENT ELEMENTS; COMPOSITION DEPTH PROFILES; HIGH RESOLUTION; HIGH-RESOLUTION SPECTRA; INTERFACIAL LAYER; METALLIC OXIDES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79957465311     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.03.015     Document Type: Article

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