Atomic layer deposition and superconducting properties of NbSi films

Journal of Physical Chemistry C

Volumn 115, Issue 19, 2011, Pages 9477-9485

  Proslier, Thomas ^a   Klug, Jeffrey A ^a   Elam, Jeffrey W ^a   Claus, Helmut ^a   Becker, Nicholas G ^a   Pellin, Michael J ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; CHEMICAL COMPOSITIONS; DEPOSITION TEMPERATURES; GROWTH MECHANISMS; IN-SITU; NIOBIUM SILICIDE; QUADRUPOLE MASS SPECTROMETER; SUPERCONDUCTING PROPERTIES; SUPERCONDUCTING TRANSITIONS;

AMORPHOUS FILMS; ATOMIC LAYER DEPOSITION; CRYSTAL IMPURITIES; ELECTRONIC PROPERTIES; FLUORINE; GROWTH RATE; MASS SPECTROMETRY; NIOBIUM; NIOBIUM ALLOYS; OXIDE FILMS; QUARTZ; QUARTZ CRYSTAL MICROBALANCES; SILICIDES; STOICHIOMETRY; SUPERCONDUCTIVITY;

SUPERCONDUCTING FILMS;

EID: 79956112866     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp201873b     Document Type: Article

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