Wall sheath and optimal bias in magnetic filters for vacuum arc plasma sources

Applied Physics Letters

Volumn 80, Issue 3, 2002, Pages 365-367

  Zhang, T ^a   Zhang, Y C ^a   Chu, P K ^b   Brown, I G ^c  

^a BEIJING NORMAL UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN APPROACHES; ION CHARGE STATE; ION MASS; PLASMA DIFFUSION; PLASMA TRANSPORT; VACUUM ARC PLASMA SOURCES;

IONS; MAGNETIC FIELDS; MAGNETIC FILTERS; OPTIMIZATION; PLASMA DENSITY; PLASMA SOURCES; VACUUM APPLICATIONS;

MAGNETOPLASMA;

EID: 79956056774     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1431690     Document Type: Article

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