Stability of field emission current from porous n-GaAs(110)

Applied Physics Letters

Volumn 80, Issue 6, 2002, Pages 1085-1087

  Tondare, V N ^a   Naddaf, M ^a   Bhise, A B ^a   Bhoraskar, S V ^a   Joag, D S ^a   Mandale, A B ^b   Sainkar, S R ^b  

^a UNIVERSITY OF PUNE   (India)

^b NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ETCHING; FIELD ELECTRON EMISSIONS; FIELD EMISSION CURRENTS; FOWLER-NORDHEIM; HCL SOLUTION; ONSET VOLTAGES; POROUS GAAS; RESIDUAL GAS; RESIDUAL GAS PRESSURE; SPECTROSCOPIC INVESTIGATIONS; STABLE FIELDS; X-RAY PHOTOELECTRONS;

BEHAVIORAL RESEARCH; ELECTRON EMISSION; FIELD EMISSION; GALLIUM ARSENIDE; HYDROCHLORIC ACID; ION BOMBARDMENT; SEMICONDUCTING GALLIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 79956010736     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1436535     Document Type: Article

References (16)

1. D. Temple, Mater. Sci. Eng., R. 24, 183 (1999). msr MIGIEA 0927-796X
2. F. Charbonnier, Appl. Surf. Sci. 94/95, 26 (1996). asu ASUSEE 0169-4332
3. D. Arslan, A. Dehe, and H. L. Hartnagel, J. Vac. Sci. Technol. B 17, 784 (1999). jvb JVTBD9 0734-211X
4. K. Yamaguchi and S. Tada, J. Electrochem. Soc. 143, 2616 (1996). jes JESOAN 0013-4651
5. T. Ohshima, M. Okamoto, and K. Kuroda, Jpn. J. Appl. Phys., Part 2 34, L1390 (1995). jjc JAPLD8 0021-4922
6. R. Bakhtizin, S. S. Ghots, and K. K. Ratnikova, IEEE Trans. Electron Devices 38, 2398 (1991). etd IETDAI 0018-9383
7. J. L. Shaw, H. F. Gray, K. L. Jensen, and T. M. Jung, J. Vac. Sci. Technol. B 14, 2072 (1996). jvb JVTBD9 0734-211X
8. F. Ducroquet, P. Kropfeld, O. Yaradou, and A. Vanoverschelde, J. Vac. Sci. Technol. B 16, 787 (1998). jvb JVTBD9 0734-211X
9. F. Ducroquet, P. Kropfeld, O. Yaradou, and A. Vanoverschelde, J. Vac. Sci. Technol. B 17, 1553 (1999). jvb JVTBD9 0734-211X
10. P. Schmuki, D. J. Lockwood, H. J. Labbe, and J. W. Fraser, Appl. Phys. Lett. 69, 1620 (1996). apl APPLAB 0003-6951
11. V. N. Tondare, B. I. Birajdar, N. Pradeep, D. S. Joag, A. Lobo, and S. K. Kulkarni, Appl. Phys. Lett. 77, 2394 (2000). apl APPLAB 0003-6951
12. A. Modinos, Field, Thermionic and Secondary Electron Emission Spectroscopy (Plenum, New York, 1984).
13. X. Li and P. W. Bohn, J. Electron. Chem. Soc. 147, 1740 (2000).
14. D. Briggs and M. P. Seah, Practical Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy (Wiley, New York, 1984).
15. Z. Lu, M. T. Schmidt, D. Chen, R. M. Osgood, Jr., W. M. Holber, D. V. Podlesnik, and J. Forster, Appl. Phys. Lett. 58, 1143 (1991). apl APPLAB 0003-6951
16. X. S. Wang, R. J. Pechman, and J. H. Weaver, Appl. Phys. Lett. 65, 2818 (1994). apl APPLAB 0003-6951