Process planning to build Mask Projection Stereolithography parts with accurate vertical dimensions

18th Solid Freeform Fabrication Symposium, SFF 2007

Volumn , Issue , 2007, Pages 159-173

  Limaye, Ameya ^a   Rosen, David ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS EXPOSURE; HIGH RESOLUTION; LAYER BY LAYER; MANUFACTURING PROCESS; MASK PROJECTION; MULTIPLE LAYERS; TRANSIENT PHENOMENON; VERTICAL DIMENSIONS;

CURING;

EID: 79955695203     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. Bertsch, A., Zissi, S., Jezequel, J., Corbel, S., Andre, J. 1997. Microstereolithography using liquid crystal display as dynamic mask-generator. Microsystems Technologies 3(2): 42-47.
2. Chatwin, C., Farsari, M., Huang, S., Heywood, M., Birch, P., Young, R., Richardson, J. 1998. UV microstereolithography system that uses spatial light modulator technology. Applied Optics 37(32): 7514-22.
3. Hadipoespito G., Yang Y., Choi H., Ning G., Li X. 2003. Digital Micromirror device based microstereolithography for micro structures of transparent photopolymer and nanocomposites. Proceedings of the 14th Solid Freeform Fabrication Symposium, Austin TX: 13-24.
4. Jacobs, P. 1992. Rapid Prototyping and Manufacturing: Fundamentals of StereoLithography. Society of Manufacturing Engineers.
5. Limaye A., Rosen D. 2004. Quantifying dimensional accuracy of a Mask Projection Micro Stereolithography System. Proceedings of the 15th Solid Freeform Fabrication Symposium, Austin Texas: 481-492.
6. Limaye, A. 2004. Design and Analysis of a Mask Projection Micro-Stereolithography System, Masters Thesis, Georgia Institute of Technology, Atlanta GA.
7. Limaye, A. and Rosen, D. 2006. Compensation zone approach to avoid print-through errors in Mask projection Stereolithography builds, Rapid Prototyping Journal 12(5): 283-291.
8. Limaye, A and Rosen, D 2007. Process planning method for mask projection micro- stereolithography, Rapid Prototyping Journal 13(2): 76-84.
9. Monneret, S., Loubere, V., Corbel, S. 1999. Microstereolithography using dynamic mask generator and a non-coherent visible light source Proc. SPIE 3680: 553-561.