Controllable wettability of poly(ethylene terephthlate) film modified by oxygen combined inductively and capacitively coupled radio-frequency plasma

Applied Surface Science

Volumn 257, Issue 16, 2011, Pages 7350-7358

  Lei, M K ^a   Liu, Y ^a   Li, Y P ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Capacitively coupled plasma; Dynamic contact angle; Inductively coupled plasma; Oxygen; Poly(ethylene terephthalate); Radio frequency plasma modification; Wettability

Indexed keywords

CONTACT ANGLE; ETHYLENE; INDUCTIVELY COUPLED PLASMA; OXYGEN; PLASMA DENSITY; PLASMA ETCHING; POLYETHYLENE TEREPHTHALATES; RADIO WAVES; WAVE PLASMA INTERACTIONS; WETTING;

ADVANCING CONTACT ANGLE; CAPACITIVELY COUPLED PLASMAS; DYNAMIC CONTACT ANGLE; LOW SURFACE ROUGHNESS; PLASMA FUNCTIONALIZATION; POLAR FUNCTIONAL GROUPS; POLY(ETHYLENE TEREPHTHALATE) (PET); RADIO FREQUENCY PLASMA;

SURFACE ROUGHNESS;

EID: 79955595844     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.03.145     Document Type: Article

References (28)

1. A.M. Wrobel, M. Kryszewski, W. Rakowski, M. Okoniewskiand, and Z. Kubacki Polymer 19 1978 908
2. P.A. Ramires, L. Mirenghi, A.R. Romano, F. Palumbo, and G. Nicolardi J. Biomed. Mater. Res. A 51 2000 535
3. F. Arefi-Khonsari, G. Placinta, J. Amouroux, and G. Popa Eur. Phys. J. Appl. Phys. 4 1998 193
4. A.J. Wagner, D.H. Fairbrother, and F. Reniers Plasmas Polym. 8 2003 119
5. C.M. Chan, T.M. Ko, and H. Hiraoka Surf. Sci. Rep. 24 1996 3
6. S. Tang, and H.S. Choi J. Phys. Chem. C 112 2008 4712
7. S. Weidner, G. Kuhn, R. Decker, D. Roessner, and J. Friedrich J. Polym. Sci. A 36 1998 1639
8. S.C. Park, S.K. Kohand, and K.D. Pae Polym. Eng. Sci. 38 1998 1185
9. K.N. Pandiyaraj, V. Selvarajan, R.R. Deshmukh, and M. Bousmina Surf. Coat. Technol. 202 2008 4218
10. M.O.H. Cioffi, H.J.C. Voorwald, and R.P. Mota Mater. Charact. 50 2003 209
11. B. Gupta, J. Hilborn, C.H. Hollenstein, C.J.G. Plummer, R. Houriet, and N. Xanthopoulos J. Appl. Polym. Sci. 78 2000 1083
12. C. Riccardi, R. Barni, E. Selli, G. Mazzone, M.R. Massafra, B. Marcandalli, and G. Poletti Appl. Surf. Sci. 211 2003 386
13. D.J. Wilson, N.P. Rhodes, and R.L. Williams Biomaterials 24 2003 5069
14. X.D. Wang, X.F. Peng, and B.X. Wang Chin. J. Chem. Eng. 12 2004 615
15. F.L. Huang, Q.F. Wei, X.Q. Wang, and W.Z. Xu Polym. Test 25 2006 22
16. S. Rauf, and M.J. Kushner IEEE Trans. Plasma Sci. 27 1999 1329
17. J.E. Stevens, M.J. Sowa, and J.L. Cecchi J. Vac. Sci. Technol. A 14 1996 139
18. G.F. Zhang, S. Reuter, and V. Buck Surf. Coat. Technol. 190 2005 54
19. M.K. Lei, Z.L. Zhang, and T.C. Ma Surf. Coat. Technol. 131 2000 317
20. M.K. Lei, and X.M. Zhu J. Electrochem. Soc. B 152 2005 291
21. Y. Shin, and D.I. Yoo J. Appl. Polym. Sci. 108 2008 785
22. K.S. Siow, L. Britcher, S. Kumar, and H.J. Griesser Plasma Process. Polym. 3 2006 392
23. N. de Geyter, R. Morent, and C. Leys Nucl. Instrum. Method B 266 2008 3086
24. M.M. Hossain, D. Hegemann, A.S. Herrmann, and P. Chabrecek J. Appl. Polym. Sci. 102 2006 1452
25. A. Vesel, I. Junkar, U. Cvelbar, J. Kovac, and M. Mozetic Surf. Interface Anal. 40 2008 1444
26. M. Miyama, Y. Yang, T. Yasuda, T. Okuno, and H.K. Yasuda Langmuir 13 1997 5494
27. C. Canal, F. Gaboriau, R. Molina, P. Erra, and A. Ricard Plasma Process. Polym. 4 2007 445
28. C.N.C. Lam, N. Kim, D. Hui, D.Y. Kwok, M.L. Hair, and A.W. Neumann Colloids Surf. A 189 2001 265