Nanostructured refractory metal oxide films produced by a pulsed microplasma cluster source as active layers in microfabricated gas sensors

Japanese Journal of Applied Physics

Volumn 50, Issue 1 PART 2, 2011, Pages

  Barborini, Emanuele ^a   Ducati, Caterina ^b   Leccardi, Matteo ^a   Bertolini, Giacomo ^a   Repetto, Pietro ^a   Milani, Paolo ^c  

^a Via Franco Russoli 3   (Italy)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF MILAN   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE LAYER; DEPOSITION PROCESS; FILM MORPHOLOGY; GAS SENSING; GAS SENSING APPLICATIONS; GAS SENSORS; METAL OXIDE FILM; MICROFABRICATED; NANO SCALE; NANO-STRUCTURED; NANO-STRUCTURED LAYER; NANOSTRUCTURED FILMS; POROUS STRUCTURES; PULSED MICROPLASMA CLUSTER SOURCES; ROOM TEMPERATURE; SOFT LANDING; SUPERSONIC CLUSTER BEAM DEPOSITION; THERMAL TREATMENT;

CHEMICAL DETECTION; CHEMICAL MODIFICATION; CRYSTAL STRUCTURE; GAS DETECTORS; GAS SENSING ELECTRODES; GRAIN GROWTH; METALLIC COMPOUNDS; METAMATERIALS; MICROFABRICATION; MOLYBDENUM; MOLYBDENUM OXIDE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; NIOBIUM; NIOBIUM OXIDE; PLASMA DEVICES; REFRACTORY MATERIALS;

OXIDE FILMS;

EID: 79955160987     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.01AK01     Document Type: Conference Paper

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