Microelectrode arrays for electroanalytical sensing: Comparison of electroplating and electron-beam metallisation

Electrochemistry Communications

Volumn 13, Issue 5, 2011, Pages 414-417

  Lançon, Alice Delcourt ^a   Kataky, Ritu ^a   Wood, David ^a   Gallant, Andrew J ^a  

^a DURHAM UNIVERSITY   (United Kingdom)

Author keywords

Array; Atomic Force Microscopy; Metallisation; Microelectrode; Roughness

Indexed keywords

AFM; ARRAY; ATOMIC FORCE; ELECTROCHEMICAL RESPONSE; ELECTROPLATING TECHNIQUE; GOLD MICROELECTRODES; METALLISATION; MICROELECTRODE ARRAY; OXYGEN PLASMA TREATMENTS; ROUGHNESS;

ATOMIC FORCE MICROSCOPY; CYCLIC VOLTAMMETRY; ELECTROPLATING; OXYGEN; PLASMA APPLICATIONS; SURFACE DEFECTS; SURFACE ROUGHNESS;

MICROELECTRODES;

EID: 79954572854     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2011.02.007     Document Type: Article

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