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Journal of Materials Chemistry

Volumn 21, Issue 17, 2011, Pages 6370-6374

Sol-gel processing of silicon nitride films from Si(NHMe)4 and ammonia

(3) Hassan, Shereen a,b Hector, Andrew L a Kalaji, Ali a,c

a UNIVERSITY OF SOUTHAMPTON (United Kingdom)

b Helwan University (Egypt)

c UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON AND HYDROGENS; DIP COATING; GELATION PROCESS; SILICON NITRIDE FILM; SILICON WAFER SUBSTRATES; SOL-GEL PROCESSING; SURFACE OXIDATIONS; TRIFLUOROMETHANE SULFONIC ACID;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; COAGULATION; GELATION; GELS; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SILICON WAFERS; SOL-GEL PROCESS; SOL-GELS; SOLS;

AMORPHOUS SILICON;

EID: 79954441000 PISSN: 09599428 EISSN: 13645501 Source Type: Journal
DOI: 10.1039/c1jm10127g Document Type: Article

Times cited : (7)

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