Properties of composite a-C:H/metal layers deposited by combined RF PECVD/magnetron sputtering techniques

Thin Solid Films

Volumn 519, Issue 12, 2011, Pages 4054-4058

  Acsente, T ^a   Ionita, E R ^a   Colceag, D ^a   Moldovan, A ^a   Luculescu, C ^a   Birjega, R ^a   Dinescu, G ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Hydrogenated amorphous carbon; Magnetron sputtering; Metal carbon composite; Multilayer film; Sequential deposition

Indexed keywords

AFM; COMPOSITE LAYER; DEPOSITION METHODS; EXPOSURE-TIME; HYDROGENATED AMORPHOUS CARBON; MAGNETRON-SPUTTERING DEPOSITION; MATERIAL COMPOSITIONS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; PROCESS LIMITS; PROPERTIES OF COMPOSITES; SEM; SEQUENTIAL DEPOSITION; SILICON SUBSTRATES; SPUTTERING TECHNIQUES; XRD;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON CARBON COMPOSITES; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HYDROGENATION; MAGNETRON SPUTTERING; MULTILAYER FILMS; MULTILAYERS; NANOCOMPOSITE FILMS; PLASMA SOURCES; SUBSTRATES;

PLASMA DEPOSITION;

EID: 79953679240     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.201     Document Type: Article

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