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Volumn 321, Issue 1, 2011, Pages 151-156
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Patterned growth of high aspect ratio silicon wire arrays at moderate temperature
a
CEA GRENOBLE
(France)
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Author keywords
A1. Doping; A3. Vapor phase epitaxy; B2. Semiconducting silicon; B3. Solar cells
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Indexed keywords
BORON COMPOUNDS;
CHEMICAL VAPOR DEPOSITION;
CHLORINE COMPOUNDS;
SILICON WAFERS;
WIRE;
HIGH ASPECT RATIO;
HYDROGEN CHLORIDE;
IN-SITU DOPING;
MODERATE TEMPERATURE;
PATTERN FIDELITY;
PATTERNED GROWTH;
SILICON WIRES;
TWO-STEP PROCESS;
ASPECT RATIO;
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EID: 79953245551
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2011.02.024 Document Type: Article |
Times cited : (7)
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References (20)
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