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Volumn 321, Issue 1, 2011, Pages 151-156

Patterned growth of high aspect ratio silicon wire arrays at moderate temperature

Author keywords

A1. Doping; A3. Vapor phase epitaxy; B2. Semiconducting silicon; B3. Solar cells

Indexed keywords

BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; CHLORINE COMPOUNDS; SILICON WAFERS; WIRE;

EID: 79953245551     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.02.024     Document Type: Article
Times cited : (7)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.