The effects of HCl on silicon nanowire growth: Surface chlorination and existence of a 'diffusion-limited minimum diameter'

Nanotechnology

Volumn 20, Issue 47, 2009, Pages

  Oehler, F ^a   Gentile, P ^a   Baron, T ^b   Ferret, P ^c  

^a CEA GRENOBLE   (France)

^b GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^c CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DIAMETER LIMIT; DIFFUSION LIMITED; GOLD CATALYSTS; LOWER BOUNDS; SILICON NANOWIRES; SILICON SURFACES; SURFACE MIGRATION; WIRE DIAMETER;

CATALYSIS; CATALYSTS; CHLORINATION; CONTROL THEORY; ELECTRIC WIRE; GOLD; NANOWIRES;

GOLD DEPOSITS;

GOLD; HYDROCHLORIC ACID; NANOWIRE; SILANE; SILICON;

ARTICLE; CATALYST; CHLORINATION; NANOCHEMISTRY; NANOFABRICATION; NANOTECHNOLOGY; PRESSURE; PRIORITY JOURNAL; VAPOR;

EID: 70449747826     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/47/475307     Document Type: Article

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