Erbium - Oxygen interactions in crystalline silicon

Semiconductor Science and Technology

Volumn 26, Issue 5, 2011, Pages

  Franzo G ^a   Napolitani, E ^b   Cardile, P ^a   Boninelli, S ^a   Marino, A ^c   Priolo, F ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b UNIVERSITY OF PADOVA   (Italy)

^c CNR IMM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE SILICONS; ER-DOPED; OPTICAL ACTIVITY; OUT-DIFFUSION; OXYGEN INTERACTION; PHOTOLUMINESCENCE PROPERTIES; SI CRYSTALS; SI SURFACES; THERMAL TREATMENT; THERMAL-ANNEALING;

CRYSTALLINE MATERIALS; OXYGEN;

ERBIUM;

EID: 79953240915     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/26/5/055002     Document Type: Article

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