Rotatable magnetron sputtering: Downscaling for better understanding

Materials Technology

Volumn 26, Issue 1, 2011, Pages 3-9

  De Gryse, R ^a   Depla, D ^a   Mahieu, S ^a   Haemers, J ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Rotatable magnetron; Sputtering

Indexed keywords

COATING APPLICATION; COATING BUSINESS; COATING SYSTEM; CURRENT DISCHARGE; CYLINDRICAL TARGET; DOWN-SCALING; FRAGILE MATERIALS; GLASS COATING; HIGH ENERGY; IN-LINE; LOW ENERGIES; NEW TECHNOLOGIES; PLANARS; REDEPOSITION; ROTATABLE MAGNETRON; ROTATABLE MAGNETRON SPUTTERING; ROTATION SPEED; SMALL SYSTEMS; SPUTTERED MATERIALS; SPUTTERING PROCESS; TWO BEAMS;

CYLINDERS (SHAPES); PEROVSKITE;

COATINGS;

EID: 79953226713     PISSN: 10667857     EISSN: None     Source Type: Journal    
DOI: 10.1179/175355511X12941605982109     Document Type: Article

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