Time-resolved interferometry of femtosecondlaser-induced processes under tight focusing and close-to-optical breakdown inside borosilicate glass

Optics Express

Volumn 19, Issue 7, 2011, Pages 5725-5734

  Hayasaki, Yoshio ^a   Isaka, Mitsuhiro ^a   Takita, Akihiro ^a   Juodkazis, Saulius ^b  

^a UTSUNOMIYA UNIVERSITY   (Japan)

^b SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS LASERS; INTERFEROMETRY; LIGHT REFRACTION; REFRACTIVE INDEX; REFRACTOMETERS; THERMAL EXPANSION; ULTRASHORT PULSES;

CARRIER GENERATION; DIFFERENT PROCESS; FEMTOSECOND LASER PULSE; FS-LASER; HIGHEST RESOLUTIONS; LATERAL RESOLUTION; OPTICAL APPLICATIONS; OPTICAL BREAKDOWN; QUANTITATIVE ESTIMATION; REFRACTIVE INDEX CHANGES; SEQUENCE OF EVENTS; SHORT LASER PULSE; STRUCTURING OF GLASS; THRESHOLD ENERGY; THRESHOLD INTENSITY; TIGHT FOCUSING; TIME AND SPACE; TIME-RESOLVED; TIME-RESOLVED INTERFEROMETRY;

BOROSILICATE GLASS;

BORON; GLASS; SILICATE;

ARTICLE; INTERFEROMETRY; LASER; MATERIALS TESTING; METHODOLOGY; RADIATION EXPOSURE;

BORON; GLASS; INTERFEROMETRY; LASERS; MATERIALS TESTING; SILICATES;

EID: 79953173292     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.005725     Document Type: Article

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