Silicon nitride films as the diffusion barriers for flexible CIGS thin film solar cells

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7995, Issue , 2011, Pages

  Qin, Juan ^a   Li, Aimin ^a   Chen, Zhenyi ^a   Zhao, Lei ^a   Zhang, Xiaoli ^a   Shi, Weimin ^a   Wei, Guangpu ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

Barrier; CIGS; Flexible; Si3+xN4 x

Indexed keywords

ABSORPTION LAYER; BARRIER; BARRIER LAYERS; BLOCKING EFFECT; CELL PERFORMANCE; CIGS; CIGS THIN FILMS; CONTACT LAYERS; DIFFUSION BARRIER LAYERS; FLEXIBLE; GLASS SUBSTRATES; I-V MEASUREMENTS; IMPURITY DIFFUSION; METAL IMPURITIES; METAL SUBSTRATE; SEM; SI3+XN4-X; SILICON NITRIDE FILM; STAINLESS STEEL SUBSTRATES; STRUCTURAL AND ELECTRICAL PROPERTIES;

ELECTRIC PROPERTIES; FILM GROWTH; IMPURITIES; MOLYBDENUM; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON NITRIDE; STAINLESS STEEL; STEEL SHEET; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

DIFFUSION BARRIERS;

EID: 79953056878     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.888292     Document Type: Conference Paper

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