Transparent p-type CuxS thin films

Journal of Alloys and Compounds

Volumn 509, Issue 16, 2011, Pages 5099-5104

  Parreira, P ^a   Lavareda, G ^a   Amaral, A ^b   Botelho Do Rego, A M ^b   Conde, O ^c   Valente, J ^a   Nunes, F ^a   Nunes De Carvalho, C ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b UNIVERSITY OF LISBON   (Portugal)

^c UNIVERSITY OF LISBON   (Portugal)

Author keywords

CuxS thin films; Mild post deposition annealing treatments; p type conductivity; Vacuum evaporation

Indexed keywords

ANNEALED FILMS; ANNEALING TIME; COPPER CONTENT; COPPER SULPHIDES; COVELLITE; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; OPTICAL TRANSMITTANCE; P-TYPE; P-TYPE CONDUCTION; P-TYPE CONDUCTIVITY; POST ANNEALING; POST ANNEALING TREATMENT; POST DEPOSITION ANNEALING; POWDER MIXTURES; RESISTIVE FILM; ROOM TEMPERATURE; S THIN FILMS; SEMICONDUCTIVE; SULPHATES; VACUUM THERMAL EVAPORATION;

ANNEALING; CARRIER CONCENTRATION; CHEMICAL PROPERTIES; CONDUCTIVE FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY; EVAPORATION; OXYGEN; PHASE TRANSITIONS; STOICHIOMETRY; SUBSTRATES; SULFUR; THERMAL EVAPORATION; THIN FILMS; VACUUM; VACUUM EVAPORATION; VAPOR DEPOSITION;

COPPER;

EID: 79953056171     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2011.01.174     Document Type: Article

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