Study on crystallization of amorphous silicon using CeO2 seed layer patterned on the plastic substrate

Materials Science in Semiconductor Processing

Volumn 7, Issue 4-6 SPEC. ISS., 2004, Pages 423-426

  Shim, Myung Suk ^a   Gowtham, M ^a   Kim, Do Young ^a   Seo, Chang Ki ^a   Yi, Junsin ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CERIUM COMPOUNDS; CONTAMINATION; CRYSTAL STRUCTURE; CRYSTALLIZATION; EXCIMER LASERS; LIQUID CRYSTAL DISPLAYS; MATERIALS SCIENCE; RAMAN SCATTERING; SEMICONDUCTING FILMS; SPUTTERING; THIN FILM TRANSISTORS;

METAL-INDUCED CRYSTALLIZATION (MIC); PLASTIC SUBSTRATES; POLYETHERSULFONE (PES); SOLID-PHASE CRYSTALLIZATION (SPC);

AMORPHOUS SILICON;

EID: 9544224166     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mssp.2004.09.133     Document Type: Conference Paper

References (8)

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