Photopatternable poly(4-styrene sulfonic acid)-Wrapped MWNT thin-film source/drain electrodes for use in organic field-effect transistors

ACS Applied Materials and Interfaces

Volumn 3, Issue 1, 2011, Pages 74-79

  Hong, Kipyo ^a   Kim, Se Hyun ^a   Yang, Chanwoo ^a   Yun, Won Min ^a   Nam, Sooji ^a   Jang, Jaeyoung ^a   Park, Chanjun ^b   Park, Chan Eon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Seoul National University of Science and Technology   (South Korea)

Author keywords

Carbon nanotube; Contact resistance; Organic field effect transistor; Photopatternable; Solution processable; Source drain electrodes

Indexed keywords

COMPOSITE THIN FILMS; FOURIER TRANSFORM INFRARED; LINKABLE; PHOTOCROSS-LINKING; PHOTOPATTERNABLE; PHOTOPATTERNED; POLYMER CHAINS; PROCESSABLE; SOURCE/DRAIN ELECTRODES; SULFONIC ACID; SULFONIC ACID GROUPS; ULTRAVIOLET LIGHTS; UV EXCITATION;

CARBON FILMS; COMPOSITE FILMS; CONDUCTIVE FILMS; CONTACT RESISTANCE; ELECTRODES; FIELD EFFECT TRANSISTORS; FOURIER TRANSFORMS; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCOMPOSITE FILMS; STYRENE; WORK FUNCTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANIC FIELD EFFECT TRANSISTORS;

CARBON NANOTUBE; POLYMER; STYRENESULFONIC ACID POLYMER; SULFONIC ACID DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; ELECTRODE; INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR; SURFACE PROPERTY;

ELECTRODES; MICROSCOPY, ELECTRON, SCANNING; MOLECULAR STRUCTURE; NANOTUBES, CARBON; POLYMERS; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SULFONIC ACIDS; SURFACE PROPERTIES; TRANSISTORS, ELECTRONIC;

EID: 79952999701     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am1008826     Document Type: Article

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