Characterization of silicon-on-glass substrates using variable angle spectroscopic ellipsometry

ECS Transactions

Volumn 33, Issue 5, 2010, Pages 135-142

  Rettmann, R D ^a   Couillard, J G ^b   Hirschman, K D ^a  

^a Rochester Institute of Technology   (United States)

^b Corning Incorporated ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITY; GLASS; NONDESTRUCTIVE EXAMINATION; SILICON; SPECTROSCOPIC ELLIPSOMETRY; THIN FILM TRANSISTORS;

CRITICAL LAYER; DISPERSION PROPERTIES; MEASUREMENT TECHNIQUES; NONDESTRUCTIVE CHARACTERIZATION; SILICON-ON-GLASS; SUBSTRATE GLASS; TRANSPARENT SUBSTRATE; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

SUBSTRATES;

EID: 79952688076     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3481227     Document Type: Conference Paper

References (10)

1. K. Vedam, Thin Solid Films, 313-314, 1 (1998).
2. 2000® AMLCD Glass Substrates Material Information, Corning Incorporated (2002).
3. D. F. Dawson-Elli, C. A. K. Williams, J. G. Couillard, J. S. Cites, R. G. Manley, G. Fenger and K. D. Hirschman, ECS Transactions, 8, 223 (2007).
4. R. Manley, G. Fenger, P. Meller, K. Hirschman, C. A. K. Williams, D. Dawson-Elli, J. G. Couillard and J. Cites, ECS Transactions, 16, 371 (2008).
5. J. S. Cites, J. G. Couillard and K. P. Gadkaree, in SOI Conference, 2009 IEEE International, p. 1 (2009).
6. H. G. Tompkins, E. A. Irene and Knovel (Firm), Handbook of Ellipsometry, Springer, Norwich, NY (2005).
7. D. W. Marquardt, SIAM Journal on Applied Mathematics, 11, 431 (1963).
8. D. E. Aspnes, Thin Solid Films, 89, 249 (1982).
9. Y. H. Yang and J. R. Abelson, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 13, 1145 (1995).
10. T. Zhu, P. Argyrakis, E. Mastropaolo, K. K. Lee and R. Cheung, in, p. 2553 (2007).