Structural, optical and electrical properties of v doped ZnO thin films deposited by r.f. magnetron sputtering

Journal of Physics: Conference Series

Volumn 253, Issue 1, 2010, Pages

  Lovchinov, K ^a   Nichev, H ^a   Angelov, O ^a   Sendova Vassileva, M ^a   Mikli, V ^b   Dimova Malinovska, D ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b TALLINN UNIVERSITY OF TECHNOLOGY   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; METALLIC FILMS; MOLECULAR ELECTRONICS; OPTICAL FILMS; SUBSTRATES; ZINC OXIDE;

CRYSTALLOGRAPHIC ORIENTATIONS; GLASS SUBSTRATES; LOW RESISTIVITY; MAGNETRON CO-SPUTTERING; OPTICAL AND ELECTRICAL PROPERTIES; R.F. MAGNETRON SPUTTERING; SUBSTRATE SURFACE; VANADIUM CONTENT;

THIN FILMS;

EID: 79952429693     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/253/1/012030     Document Type: Conference Paper

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