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Volumn 519, Issue 10, 2011, Pages 3318-3324

Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films

(9) Pore, Viljami a,f Dimri, Mukesh b Khanduri, Himani b,c Stern, Raivo b Lu, Jun d Hultman, Lars d Kukli, Kaupo a,e Ritala, Mikko a Leskelä, Markku a

a UNIVERSITY OF HELSINKI (Finland)

b NATIONAL INSTITUTE OF CHEMICAL PHYSICS AND BIOPHYSICS (Estonia)

c TALLINN UNIVERSITY OF TECHNOLOGY (Estonia)

d LINKÖPING UNIVERSITY (Sweden)

e UNIVERSITY OF TARTU (Estonia)

f ASM Microchemistry Oy (Finland)

Author keywords

Atomic layer deposition; films; Magnetic properties of monolayers and thin; Magnetization moments and magnetic; susceptibilities

Indexed keywords

ACETYLACETONATES; ANNEALED FILMS; CATION RATIO; CO FILMS; COBALT OXIDES; COERCIVE FIELD; MAGNETIC RESPONSE; MAGNETIZATION CURVES; METAL PRECURSOR; OXYGEN PRECURSORS; RUTILE AND ANATASE; SUSCEPTIBILITIES; TIO; TITANIUM OXIDE THIN FILMS;

ATOMIC LAYER DEPOSITION; ATOMS; DEPOSITION; MAGNETIC PROPERTIES; MAGNETIZATION; MONOLAYERS; OXIDE FILMS; OXIDE MINERALS; OZONE; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPOR DEPOSITION;

COBALT;

EID: 79952316245 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.191 Document Type: Article

Times cited : (18)

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