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Thin Solid Films

Volumn 519, Issue 10, 2011, Pages 3026-3028

Effects of annealing atmosphere on thermoelectric signals from ZnO films

(5) Zhou, X F a Zhang, H b Chen, Q M b Shang, J b Zhang, P X b

a CHANGZHI UNIVERSITY (China)

b KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

Author keywords

Annealing; Light induced voltage; Pulse laser deposition; Thermoelectric properties; Thin films; Zinc oxide

Indexed keywords

ANNEALING ATMOSPHERES; CRYSTALLINE QUALITY; EPILAYER FILMS; IN-SITU ANNEALING; KRF EXCIMER LASER; LASER INDUCED THERMOELECTRIC VOLTAGES; OXYGEN AMBIENT; OXYGEN PRESSURE; PULSE LASER DEPOSITION; SEEBECK; THERMOELECTRIC PROPERTIES; THERMOELECTRIC SIGNALS; TILTING ANGLE; VICINAL-CUT SAPPHIRES; ZNO FILMS; ZNO LAYERS;

ANNEALING; DEPOSITION; ELECTRONIC PROPERTIES; EXCIMER LASERS; GAS LASERS; METALLIC FILMS; OXIDE FILMS; OXYGEN; PULSED LASER DEPOSITION; SUBSTRATES; THERMOELECTRIC EQUIPMENT; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

PULSED LASERS;

EID: 79952310402 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.011 Document Type: Article

Times cited : (16)

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