SCOPUS 정보 검색 플랫폼

Volumn 46, Issue 10, 2011, Pages 3632-3638

The influence of deposition temperature on the microstructure of isotropic pyrocarbon obtained by hot-wall chemical vapor deposition

(5) Zhang, Dong Sheng a Li, Ke Zhi a Li, He Jun a Guo, Ling Jun a Lu, Jin Hua a

a NORTHWESTERN POLYTECHNICAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ARCHIMEDES METHODS; DEPOSITION TEMPERATURES; GRAPHENE LAYERS; LATTICE IMAGES; PYROCARBONS; SCANNING ELECTRON MICROSCOPES; SELECTED AREA ELECTRON DIFFRACTION PATTERN; STRUCTURAL PARAMETER; TEM; TEMPERATURE RISE; TRANSMISSION ELECTRON MICROSCOPE;

CHEMICAL VAPOR DEPOSITION; DIFFRACTION; ELECTRON MICROSCOPES; ETHANOL; GRAPHENE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

WALLS (STRUCTURAL PARTITIONS);

EID: 79952191623 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-011-5279-0 Document Type: Article

Times cited : (15)

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