Early stages of the chemical vapor deposition of pyrolytic carbon investigated by atomic force microscopy

Carbon

Volumn 48, Issue 3, 2010, Pages 921-923

  Pfrang, Andreas ^a   Wan, Yong Zhong ^a   Schimmel, Thomas ^a,b  

^a UNIVERSITY OF KARLSRUHE   (Germany)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CONTRAST; DEPOSITION PROCESS; PYROLYTIC CARBON; RANDOM NUCLEATION; RESIDENCE TIME; SECONDARY NUCLEATION; SILICON SUBSTRATES;

ATOMIC FORCE MICROSCOPY; CARBON FILMS; CHEMICAL VAPOR DEPOSITION;

NUCLEATION;

EID: 71649106586     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.10.031     Document Type: Letter

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