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Volumn 88, Issue 4, 2011, Pages 499-502

Germanium substrate loss during thermal processing

Author keywords

Annealing; Doping profiles; Elemental semiconductors; Germanium; Thermal etching

Indexed keywords

ARRHENIUS LAW; BULK MATERIALS; CAPPING LAYER; DESORPTION RATE; DIRECT-EVAPORATION; DOPING PROFILES; ELEMENTAL SEMICONDUCTORS; GERMANIUM DIOXIDE; GERMANIUM SUBSTRATES; HIGH CARRIER MOBILITY; LOW VAPOR PRESSURES; P-N JUNCTION; PATTERNED SILICON; SUBSTRATE LOSS; SURFACE DEGRADATION; THERMAL ETCHING; THERMAL PROCESSING;

EID: 79751535393     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.08.031     Document Type: Conference Paper
Times cited : (31)

References (17)
  • 1
    • 79751527876 scopus 로고    scopus 로고
    • Available from
    • Available from: < http://www.itrs.net/ >.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.