Langasite for microelectromechanical systems

Physica Status Solidi (A) Applications and Materials Science

Volumn 208, Issue 2, 2011, Pages 377-389

  Ansorge, Erik ^a   Schmidt, Bertram ^a   Sauerwald, Jan ^b   Fritze, Holger ^b  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

etching; langasite; microelectromechanical systems; piezoelectric devices

Indexed keywords

CONDUCTANCE SPECTRA; CONVEX SHAPES; DEVICE FABRICATIONS; DRY ETCHING PROCESS; LANGASITE; LANGASITES; MICRO ELECTRO MECHANICAL SYSTEM; MICROELECTROMECHANICAL SYSTEMS; MICROMACHINING TECHNOLOGIES; PLANAR RESONATORS; Q-FACTORS; THICKNESS SHEAR MODES; WET-ETCHING PROCESS; WORKING TEMPERATURES;

COMPOSITE MICROMECHANICS; CRYSTAL RESONATORS; DRY ETCHING; FABRICATION; GALLIUM; LITHOGRAPHY; MECHATRONICS; MEMS; PHOTORESISTS; PIEZOELECTRICITY; PLASMA ETCHING; Q FACTOR MEASUREMENT; SILICATES; WET ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 79751483126     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.201026508     Document Type: Article

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