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Applied Physics A: Materials Science and Processing

Volumn 102, Issue 2, 2011, Pages 339-343

MFM and AFM study of thin cobalt films modified by fluorosilane

(2) Cichomski, Michał b Szmaja, Witold a

a UNIVERSITY OF LODZ (Poland)

b NONE

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AFM IMAGING; COBALT FILM; FILM SURFACES; FLUOROSILANES; HEXAGONAL CLOSE-PACKED; POLYCRYSTALLINE; SI (100) SUBSTRATE; THIN COBALT FILMS; VAPOR PHASE DEPOSITION;

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; COBALT; CRYSTALLOGRAPHY; MAGNETIC FORCE MICROSCOPY;

MAGNETIC DOMAINS;

EID: 79651473161 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5979-3 Document Type: Article

Times cited : (10)

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