Superparamagnetic photocurable nanocomposite for the fabrication of microcantilevers

Journal of Micromechanics and Microengineering

Volumn 21, Issue 2, 2011, Pages

  Suter, M ^a   Ergeneman, O ^a   Zurcher J ^a   Schmid, S ^a,b   Camenzind, A ^a,c   Nelson, B J ^a   Hierold, C ^a  

^a ETH ZURICH   (Switzerland)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c Optotune AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CONVENTIONAL PHOTOLITHOGRAPHY; EXPOSURE DOSE; MAGNETIC MEASUREMENTS; MAGNETIC POLYMERS; MAGNETIZATION-SATURATION; MATRIX; MICRO-CANTILEVERS; OFF-CHIP; PARTICLE AGGLOMERATIONS; PHOTOCURABLE; PHOTOCURABLE POLYMERS; SACRIFICIAL LAYER; SUPERPARAMAGNETIC NANOPARTICLES; SUPERPARAMAGNETICS; TRANSMISSION ELECTRON MICROSCOPE; UNIFORM DISTRIBUTION; UV ABSORPTION; UV-VIS SPECTROMETER;

AGGLOMERATION; COMPOSITE MICROMECHANICS; FABRICATION; MAGNETIC FIELDS; NANOCANTILEVERS; NANOCOMPOSITES; NANOPARTICLES; PHOTOLITHOGRAPHY; SATURATION MAGNETIZATION; SUPERPARAMAGNETISM; SURFACE ACTIVE AGENTS; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL SENSORS;

EID: 79551696047     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/2/025023     Document Type: Article

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