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Applied Physics A: Materials Science and Processing

Volumn 102, Issue 1, 2011, Pages 131-135

Effect of hydrogen on hardness of amorphous silicon

(5) Danesh, P a Pantchev, B a Wiezorek, J b Schmidt, B c Grambole, D c

a INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

b University of Pittsburgh (United States)

c INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

A-SI:H; AMORPHOUS SILICON (A-SI); COMPARATIVE STUDIES; CRYSTALLINE SILICONS; EFFECT OF HYDROGEN; EFFECTIVE TOOL; HYDROGEN CONCENTRATION; HYDROGENATED AMORPHOUS SILICON (A-SI:H); PLASMA HYDROGENATION; PLASTIC PROPERTY; POST-DEPOSITION; POSTHYDROGENATION; THERMAL-ANNEALING;

AMORPHOUS FILMS; CRYSTALLINE MATERIALS; DEPTH PROFILING; HARDNESS; HYDROGEN; HYDROGENATION; NANOINDENTATION; SEMICONDUCTING SILICON COMPOUNDS;

AMORPHOUS SILICON;

EID: 79551681458 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-6026-0 Document Type: Article

Times cited : (12)

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