Control of microelectromechanical systems membrane curvature by silicon ion implantation

Applied Physics Letters

Volumn 83, Issue 12, 2003, Pages 2321-2323

  Jin, S ^a   Mavoori, H ^b   Kim, J ^c   Aksyuk, V A ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HAWAII PACIFIC UNIVERSITY   (United States)

^c LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GOLD; ION IMPLANTATION; LIGHT REFLECTION; METALLIZING; MICROELECTROMECHANICAL DEVICES;

OPTICAL PERFORMANCE;

SILICON;

EID: 0142058479     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1611639     Document Type: Article

References (8)

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2. Fundamentals of Microfabrication: The Science of Miniaturization, 2nd ed., M. J. Madou, CRC Press, 2002.
3. Optical MEMS, edited by V. M. Bright, SPIE Milestone Series, Vol. MS 153 (SPIE Press, Bellingham, WA, 1999).
4. R. Ryf, J. Kim, J. P. Hickey, et al. Proceedings of the OFC'2001 (Optical Fiber Conference), Anaheim, CA, 17-22 March 2001, Vol. 4, Paper PD-28, pp. 1-3.
5. T. B. Bifano, H. T. Johnson, P. Bierden, and R. K. Mali, J. Microelectromech. Syst. 11, 592 (2002).
6. L. Krasnobaev, private communication, Implant Sciences Corp., Wake-field, Massachusetts.
7. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
8. E. Suhir, private communications.