Imprinting self-assembled patterns of lines at a semiconductor surface, using heat, light, or electrons

Proceedings of the National Academy of Sciences of the United States of America

Volumn 108, Issue 3, 2011, Pages 950-955

  Harikumar, K R ^a   McNab, Iain R ^a   Polanyi, John C ^a   Zabet Khosousi, Amir ^a   Hofer, Werner A ^b  

^a UNIVERSITY OF TORONTO   (Canada)

^b UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Dynamics; Patterning; Reaction; Self assembly

Indexed keywords

1 CHLOROPENTANE; DIMER; PENTANE; SELF ASSEMBLED MONOLAYER; SILICON; UNCLASSIFIED DRUG;

ATOM; CHEMICAL REACTION; ELECTRON; ENERGY; HEAT; LIGHT; MOLECULAR IMPRINTING; MOLECULAR SCALE IMPRINTING; NANOFABRICATION; PRIORITY JOURNAL; REVIEW; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR; SURFACE PROPERTY; ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; PHYSICAL CHEMISTRY;

CHEMISTRY, PHYSICAL; ELECTRONS; HOT TEMPERATURE; LIGHT; NANOTECHNOLOGY; PENTANES; SEMICONDUCTORS; SILICON;

EID: 79551617568     PISSN: 00278424     EISSN: 10916490     Source Type: Journal    
DOI: 10.1073/pnas.1006657107     Document Type: Review

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