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EPJ Applied Physics

Volumn 53, Issue 2, 2011, Pages

Fluorine-doped ZnO thin films deposited by spray pyrolysis technique

(6) Douayar, A a Diaz, R b Cherkaoui El Moursli, F a Schmerber, G c Dinia, A c Abd Lefdil, M a

a FACULTÉ DES SCIENCES (Morocco)

b UNIVERSIDAD AUTÓNOMA DE MADRID (Spain)

c INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRACKING (CHEMICAL); FLUORINE; II-VI SEMICONDUCTORS; INFRARED DEVICES; METALLIC FILMS; OPTICAL FILMS; SEMICONDUCTOR DOPING; SPRAY PYROLYSIS; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

CHEMICAL SPRAY PYROLYSIS; ELECTRICAL CONDUCTIVITY; NEUTRAL IMPURITY SCATTERING; PREFERENTIAL ORIENTATION; SCATTERING MECHANISMS; SPRAY-PYROLYSIS TECHNIQUES; TRANSMITTANCE AND REFLECTANCES; X-RAY DIFFRACTION SPECTRUM;

THIN FILMS;

EID: 79551543903 PISSN: 12860042 EISSN: 12860050 Source Type: Journal
DOI: 10.1051/epjap/2010100364 Document Type: Article

Times cited : (26)

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