Micropatterning of sulfonated polyaniline using a soft lithography based lift-off process

Microsystem Technologies

Volumn 16, Issue 11, 2010, Pages 1951-1956

  Ferrell, Nicholas ^a   Yang, Yanyin ^a   Hansford, Derek J ^a  

^a Ohio State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVE; IN-SITU; LIFT-OFF PROCESS; MICRO PATTERNING; MICRO-MOLDING PROCESS; PATTERNED SUBSTRATES; POTENTIAL APPLICATIONS; REACTION TIME; RIGID AND FLEXIBLE SUBSTRATES; SACRIFICIAL LAYER; SOFT LITHOGRAPHY; SULFONATED POLYANILINE; THERMOPLASTIC POLYMER; VERSATILE METHODS;

ATOMIC FORCE MICROSCOPY; CONDUCTING POLYMERS; ORGANIC CONDUCTORS; ORGANIC SOLVENTS; POLYANILINE; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

LITHOGRAPHY;

EID: 79551521078     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-010-1118-5     Document Type: Article

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