Growth and characterization of NiO thin films prepared by dc reactive magnetron sputtering

Solid State Sciences

Volumn 13, Issue 2, 2011, Pages 314-320

  Reddy, A Mallikarjuna ^a   Reddy, A Sivasankar ^b   Lee, Kee Sun ^b   Reddy, P Sreedhara ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Kongju National University   (South Korea)

Author keywords

Magnetron sputtering; Nickel oxide; Optical properties; X ray diffraction

Indexed keywords

AS-DEPOSITED FILMS; CRYSTALLINITIES; DC REACTIVE MAGNETRON SPUTTERING; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; NIO FILMS; NIO THIN FILM; OPTICAL TRANSMITTANCE; SPUTTERING POWER; VISIBLE SPECTRA; XRD;

DC POWER TRANSMISSION; DIFFRACTION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; NICKEL; NICKEL OXIDE; OPTICAL PROPERTIES; OXIDE FILMS; SUBSTRATES; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 79251624058     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2010.11.019     Document Type: Article

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