Wetting behavior of high energy electron irradiated porous superhydrophobic silica films

Applied Surface Science

Volumn 257, Issue 7, 2011, Pages 3027-3032

  Rao, A Venkateswara ^a   Latthe, Sanjay S ^a   Kappenstein, Charles ^b   Ganesan, V ^c   Rath, M C ^d   Sawant, Shilpa N ^d  

^a SHIVAJI UNIVERSITY   (India)

^b UNIVERSITÉ DE POITIERS   (France)

^c UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

^d BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Liquid solid reactions; Sol gel processes; Superhydrophobic; Surfaces and interfaces

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; COPOLYMERIZATION; DROPS; ELECTRON IRRADIATION; ELECTRONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHOBICITY; PHASE INTERFACES; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GEL PROCESS; SOL-GELS;

FOURIER TRANSFORM INFRA RED (FTIR) SPECTROSCOPY; HIGH-ENERGY ELECTRON; HIGH-ENERGY ELECTRON IRRADIATION; HYDROPHOBIC MATERIAL; LIQUID-SOLID REACTION; SUPERHYDROPHOBIC; SUPERHYDROPHOBIC SILICAS; SURFACES AND INTERFACES;

WETTING;

EID: 79251600504     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.10.111     Document Type: Article

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