Control on wetting properties of spin-deposited silica films by surface silylation method

Applied Surface Science

Volumn 256, Issue 7, 2010, Pages 2115-2121

  Rao, A Venkateswara ^a   Latthe, Sanjay S ^a   Dhere, Sunetra L ^a   Pawar, Swapnali S ^a   Imai, Hiroaki ^b   Ganesan, V ^c   Gupta, Satish C ^d   Wagh, Pratap B ^d  

^a SHIVAJI UNIVERSITY   (India)

^b KEIO UNIVERSITY   (Japan)

^c University Campus   (India)

^d BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Coatings; Humidity; Hydrophobic; Sol gel process; Transparent; Wetting

Indexed keywords

AMMONIUM HYDROXIDE; ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; COATINGS; CONTACT ANGLE; ENGINEERING RESEARCH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHOBICITY; LIGHT TRANSMISSION; ORGANIC SOLVENTS; SCANNING ELECTRON MICROSCOPY; SILICA; SOL-GEL PROCESS; SPIN GLASS; SUBSTRATES;

DIFFERENTIAL THERMALS; FOURIER TRANSFORM INFRA RED (FTIR) SPECTROSCOPY; HEXAMETHYLDISILAZANE; HYDROPHOBIC; METHYLTRIMETHOXYSILANE; SUPERHYDROPHILIC BEHAVIOR; TRANSPARENT; TRIMETHYLCHLOROSILANES;

WETTING;

EID: 74149084562     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.09.057     Document Type: Article

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