Secondary ion mass spectrometry and X-ray photoelectron spectroscopy studies on TiO2 and nitrogen doped TiO2 thin films

Solid State Communications

Volumn 151, Issue 3, 2011, Pages 245-249

  Raut, N C ^a   Mathews, T ^a   Rajagopalan, S ^a   Subba Rao, R V ^a   Dash, S ^a   Tyagi, A K ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

A. N doped titanium dioxide; B. Spray pyrolysis; C. Secondary ion mass spectrometry; C. X ray photoelectron spectroscopy

Indexed keywords

ACETYLACETONATES; ANATASE PHASE; B. SPRAY PYROLYSIS; BONDING STATE; DOPED-TIO; FILM-SUBSTRATE INTERFACES; HEXAMINES; N-DOPED TITANIUM DIOXIDE; N-DOPING; NITROGEN CONTENT; NITROGEN-DOPED TIO; PRECURSOR SOLUTIONS; SECONDARY IONS; SI (100) SUBSTRATE; TEMPERATURE RANGE; TIO; ULTRASONIC SPRAY PYROLYSIS TECHNIQUE; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES; XPS;

DEPTH PROFILING; DOPING (ADDITIVES); ELECTRONS; IONS; METHANOL; NITROGEN; OXIDES; PHOTOELECTRICITY; PHOTONS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; SPECTROMETRY; STOICHIOMETRY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; ULTRASONIC TESTING; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

SPRAY PYROLYSIS;

EID: 79251593522     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2010.11.017     Document Type: Article

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