Fabrication of 3D copper oxide structure by holographic lithography for photoelectrochemical electrodes

ACS Applied Materials and Interfaces

Volumn 2, Issue 11, 2010, Pages 2982-2986

  Jin, Woo Min ^a   Kang, Ji Hwan ^a   Moon, Jun Hyuk ^a  

^a Sogang University   (South Korea)

Author keywords

electroless deposition; holographic lithography; photoelectrochemical electrode; surface modification of SU 8

Indexed keywords

BEAM INTERFERENCE; ELECTROLESS DEPOSITION; HOLOGRAPHIC LITHOGRAPHY; MULTI-LAYER-COATING; OXIDE STRUCTURES; PHOTOCURRENT EFFICIENCY; PHOTOELECTROCHEMICALS; POROUS STRUCTURES; SU-8 STRUCTURE; SURFACE MODIFICATION; SURFACE MODIFICATION OF SU-8; WOODPILE STRUCTURE;

COPPER; LITHOGRAPHY; THREE DIMENSIONAL;

SURFACE STRUCTURE;

EID: 79151482779     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100773h     Document Type: Article

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