Surface modifications using a water-stable silanetriol in neutral aqueous media

ACS Applied Materials and Interfaces

Volumn 2, Issue 10, 2010, Pages 2956-2962

  Spirk, Stefan ^a   Ehmann, Heike M ^a   Kargl, Rupert ^a   Hurkes, Natascha ^a   Reischl, Martin ^a   Novak, Jiri ^b   Resel, Roland ^b   Wu, Ming ^c   Pietschnig, Rudolf ^a   Ribitsch, Volker ^a  

^a UNIVERSITY OF GRAZ   (Austria)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

contact angle; silanetriol; surface modification; X ray reflectivity; zeta potential

Indexed keywords

AFM; AQUEOUS CONDITION; AQUEOUS MEDIA; FORMAMIDES; GLASS SLIDES; HYDROPHILIC AND HYDROPHOBIC; ISO-ELECTRIC POINTS; LAYER THICKNESS; MODIFIED SURFACES; ROOT MEAN SQUARE ROUGHNESS; SILANETRIOL; SURFACE FREE ENERGY; SURFACE MODIFICATION; THIN COATING; UV/OZONE TREATMENT; X RAY REFLECTIVITY; YIELD VALUE; ZETA POTENTIAL MEASUREMENTS;

AMIDES; ATOMIC FORCE MICROSCOPY; COATINGS; CONTACT ANGLE; HYDROPHILICITY; HYDROPHOBICITY; ORGANIC SOLVENTS; POLYETHYLENES; REFLECTION; SURFACE TREATMENT; X RAYS; ZETA POTENTIAL;

SURFACE TOPOGRAPHY;

EID: 79151472992     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100644r     Document Type: Article

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