Simple photoreduction of graphene oxide nanosheet under mild conditions

ACS Applied Materials and Interfaces

Volumn 2, Issue 12, 2010, Pages 3461-3466

  Matsumoto, Yasumichi ^a,b   Koinuma, Michio ^a,b   Kim, Su Yeon ^c   Watanabe, Yusuke ^a   Taniguchi, Takaaki ^a,b   Hatakeyama, Kazuto ^a   Tateishi, Hikaru ^a   Ida, Shintaro ^d  

^a KUMAMOTO UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c Ewha Womans University   (South Korea)

^d KYUSHU UNIVERSITY   (Japan)

Author keywords

conductive atomic force microscopy; graphene oxide; nanosheet; photopatterning; photoreduction; thin film

Indexed keywords

AFM; AQUEOUS SUSPENSIONS; CONDUCTIVE ATOMIC FORCE MICROSCOPY; EPOXY GROUP; GRAPHENE OXIDE; GRAPHENE OXIDES; HIGH CONDUCTIVITY; I - V CURVE; MICROMETER SIZES; PHOTO PATTERNING; PHOTO-REDUCTION; PHOTOREACTIONS; PHOTOREDUCTION METHOD; ROOM TEMPERATURE; TWO-ELECTRODE SYSTEMS; UV IRRADIATION;

ATOMIC FORCE MICROSCOPY; GRAPHENE; IODINE; IRRADIATION; RAMAN SPECTROSCOPY; SUSPENSIONS (FLUIDS); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

NANOSHEETS;

GRAPHITE; NANOMATERIAL; OXIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; OXIDATION REDUCTION REACTION; PARTICLE SIZE; PHOTOCHEMISTRY; RADIATION EXPOSURE; ULTRASTRUCTURE; ULTRAVIOLET RADIATION;

CRYSTALLIZATION; GRAPHITE; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; NANOSTRUCTURES; NANOTECHNOLOGY; OXIDATION-REDUCTION; OXIDES; PARTICLE SIZE; PHOTOCHEMISTRY; ULTRAVIOLET RAYS;

EID: 79151472209     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100900q     Document Type: Article

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