Ion, sputter and useful ion yields for accurate quantification of Si 1-xGex(0 < x < 1) using ultra low energy O 2+ SIMS

Surface and Interface Analysis

Volumn 43, Issue 1-2, 2011, Pages 543-546

  Morris, R J H ^a   Dowsett, M G ^a  

^a UNIVERSITY OF WARWICK   (United Kingdom)

Author keywords

ion yield; SiGe; sputter yield; UleSIMS; useful ion yield

Indexed keywords

ION YIELDS; SIGE; SPUTTER YIELDS; ULESIMS; USEFUL ION YIELD;

GERMANIUM; PALLADIUM ALLOYS; SILICON; SILICON ALLOYS; SPUTTERING;

IONS;

EID: 78951469252     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3506     Document Type: Conference Paper

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