Trench-template fabrication of indium and silicon nanowires prepared by thermal evaporation process

Journal of Nanoparticle Research

Volumn 12, Issue 7, 2010, Pages 2473-2480

  Kumar, Prashant ^a  

^a NONE

Author keywords

Nanowires; Restricted vapour supply; Surface plasmon; Templated growth

Indexed keywords

MATERIAL DEPOSITION; NANOWIRE SURFACE; QUARTZ SUBSTRATE; RESTRICTED VAPOUR SUPPLY; SILICON DEPOSITION; SILICON NANOWIRES; SILICON THIN FILM; SURFACE PLASMON; TEMPLATE FABRICATION; TEMPLATED GROWTH; THERMAL EVAPORATION PROCESS;

FABRICATION; FILM THICKNESS; INDIUM; PLASMONS; QUARTZ; SEMICONDUCTING SILICON COMPOUNDS; SURFACES; THERMAL EVAPORATION; THIN FILMS; VAPOR DEPOSITION;

NANOWIRES;

INDIUM; NANOWIRE; SILICON; SILICON DIOXIDE;

ARTICLE; EVAPORATION; FILM; NANOFABRICATION; PRIORITY JOURNAL; SURFACE PLASMON RESONANCE; TEMPERATURE; THICKNESS;

EID: 78751615810     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-009-9813-9     Document Type: Article

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