Low voltage organic devices and circuits with aluminum oxide thin film dielectric layer

Science China Technological Sciences

Volumn 54, Issue 1, 2011, Pages 95-98

  Shang, Liwei ^a   Ji, Zhuoyu ^a   Chen, Yingpin ^a   Wang, Hong ^a   Liu, Xin ^a   Han, Maixin ^a   Liu, Ming ^a  

^a INSTITUTE OF MICROELECTRONICS   (China)

Author keywords

atomic layer deposition; high k dielectric; low voltage; OFET

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; ATOMIC LAYER DEPOSITION; CAPACITANCE; DIELECTRIC MATERIALS; ELECTRIC INVERTERS; HIGH-K DIELECTRIC; ORGANIC FIELD EFFECT TRANSISTORS; OSCILLATORS (ELECTRONIC); POWER TRANSISTORS; THIN FILMS; THRESHOLD VOLTAGE; TIMING CIRCUITS;

ALUMINUM OXIDE THIN FILMS; DIELECTRIC LAYER; LOW VOLTAGES; ON/OFF CURRENT RATIO; OPERATING VOLTAGE; PROPAGATION DELAYS; SATURATION RANGE; SUPPLY VOLTAGES;

THIN FILM CIRCUITS;

EID: 78651500481     PISSN: 16747321     EISSN: 18691900     Source Type: Journal    
DOI: 10.1007/s11431-010-4213-z     Document Type: Article

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