Patterning effects on poly (3-hexylthiophene) organic thin film transistors using photolithographic processes

Organic Electronics

Volumn 8, Issue 1, 2007, Pages 44-50

  Jia, Huiping ^a   Gross, Erich K ^a   Wallace, Robert M ^a   Gnade, Bruce E ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

Organic thin film patterning; Organic thin film transistor; Photolithography

Indexed keywords

ALUMINUM COMPOUNDS; DEGRADATION; PATTERN RECOGNITION; PHOTOLITHOGRAPHY; SEMICONDUCTING ORGANIC COMPOUNDS; THIN FILM TRANSISTORS;

ORGANIC THIN FILM PATTERNING; ORGANIC THIN FILM TRANSISTORS;

ORGANIC POLYMERS;

EID: 33846325490     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2006.10.009     Document Type: Article

References (25)

1. Lidzey D.G., Voigt M., Giebeler C., Buckley A., Wright J., Böhlen K., Fieret J., and Allott R. Org. Electr. 6 (2005) 221
2. Kymissis I., Dimitrakopoulos C.D., and Purushothanman S. J. Vac. Sci. Technol. B 20 3 (2002) 956
3. Jia H., Pant G.K., Gross E.K., Wallace E.M., and Bruce B.E. Org. Electr. 7 (2006) 16
4. DeFranco J.A., Schmidt B.S., Lipson M., and Malliaras G.G. Org. Electr. 7 (2006) 22
5. Han S.H., Kim J.H., Jang J., Cho S.M., Oh M.H., Lee S.H., and Choo D.J. Appl. Phys. Lett. 88 (2006) 073519
6. Li F.M., Vygranenko Y., Koul S., and Nathan A. J. Vac. Sci. Technol. A 24 3 (2006) 657
7. Jain K., Zemel M., and Klosner M. Proc. IEEE 90 10 (2002) 1681
8. Chabinyc M.L., and Salleo A. Chem. Mater. 16 (2004) 4509
9. Reese C., Roberts M., Ling M., and Bao Z. Mater. Today 7 (2004) 20
10. Ling M., and Bao Z. Chem. Mater. 16 (2004) 4824
11. Katz H.E. Chem. Mater. 16 (2004) 4748
12. Jang J., and Han S.H. SID 05 Digest (2005) 12
13. Chabinyc M.L., Wong W.S., Salleo A., and Paul K.E. Appl. Phys. Lett. 81 (2002) 4260
14. Parashkov R., Becker E., Riedl T., Johannes H., and Kowalsky W. Adv. Mater. 17 (2005) 1523
15. Kim C., Cao Y., Soboyejo W.O., and Forrest S.R. J. Appl. Phys. 97 (2005) 113512
16. Zhou L., Park S., Bai B., Sun J., Wu S., Jackson T.N., Nelson S., Freeman D., and Hong Y. IEEE Dev. Lett. 26 (2005) 640
17. Wang Y., Cheng H., Wang Y., Hu T., Ho J., Lee C., Lei T., and Yeh C. Thin Solid Film 491 (2005) 305
18. Lewis J.S., and Weaver M.S. IEEE J. Selected Topics Quantum Electron. 10 (2004) 45
19. Jia H., Gowrisanker S., Pant G.K., Wallace R.M., and Gnade B.E. J. Vac. Sci. Technol. A 24 (2006) 1228
20. Bao Z., Dodabalapur A., and Lovinger A. Appl. Phys. Lett. 69 (1996) 4108
21. Apperloo J.J., Janssen R.A.J., Nielsen M.M., and Bechgaard K. Adv. Mater. 12 (2000) 1594
22. Mohammad F. J. Phys. D: Appl. Phys. 31 (1998) 951
23. Gomes H.L., Stallinga P., Cölle M., Biscarini F., and de Leeuw D.M. J. Non-Crystalline Solid 352 (2006) 1761
24. Gundlach D.J., Jackson T.N., Schlom D.G., and Nelson S.F. Appl. Phys. Lett. 74 (1999) 3302
25. van de Leur R.H.M., de Ruiter B., and Breen J. Synth. Met. 54 (1993) 203