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Volumn 298, Issue 1, 2010, Pages 25-33

Keynote speaker:3D stereolithography by using two-photon photopolymerization

Author keywords

3D patterning; TPA photoinitiators; two photon absorption; two photon photopolymerization

Indexed keywords

3-DIMENSIONAL; 3D PATTERNING; ABSORBING MATERIALS; CONJUGATED SYSTEMS; MICROELECTROMECHANICAL SYSTEMS; PHOTOINITIATORS; POLYMERIC STRUCTURES; TECHNIQUES USED; TWO PHOTON; TWO PHOTON POLYMERIZATION; TWO-PHOTON ABSORPTIONS; TWO-PHOTON LITHOGRAPHY; TWO-PHOTON PHOTOPOLYMERIZATION;

EID: 78651311220     PISSN: 10221360     EISSN: 15213900     Source Type: Journal    
DOI: 10.1002/masy.201000026     Document Type: Conference Paper
Times cited : (9)

References (38)
  • 2
    • 0031653880 scopus 로고    scopus 로고
    • Combining microstereolithography and thick resist UV lithography for 3D microfabrication
    • A. Bertsch, H. Lorenz, P. Renaud, Combining microstereolithography and thick resist UV lithography for 3D microfabrication. Proc IEEE MEMS 1998, 18-23
    • (1998) Proc IEEE MEMS , pp. 18-23
    • Bertsch, A.1    Lorenz, H.2    Renaud, P.3
  • 4
    • 33847446049 scopus 로고
    • T. H. Maiman, Nature 1960, 187 (4736), 493.
    • (1960) Nature , vol.187 , Issue.4736 , pp. 493
    • Maiman, T.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.